1
Jim Felton Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Artashes Amamchyan, Michael Brendan Power, Ronald L DiCarol Jr, James Edward Felton: Alkyl group VA metal compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, September 6, 2005: US06939983


A method of preparing Group VA organometal compounds in high yield and high purity by the reaction of a Grignard reagent with a Group VA metal halide in certain ethereal solvents is provided. A method of preparing Group VA organometal hydrides is also provided.


2
Nathaniel Brese Angelo Lamola
Angelo A Lamola, Nathaniel E Brese: Electronic device manufacture. Rohm and Haas Electronic Materials, S Matthew Cairns, May 9, 2006: US07041331 (1 worldwide citation)


Compositions suitable for use as underfill materials in an integrated circuit assembly are provided. Also provided are methods of preparing integrated circuit assemblies containing certain underfill materials as well as electronic devices containing such integrated circuit assemblies.


3
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 31, 2002: US20020160302-A1 (1 worldwide citation)


Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


4
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. S Matthew Cairns, Rohm and Haas Electronic Materials, August 4, 2005: US20050170278-A1


Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


5
Nathaniel Brese Angelo Lamola
Angelo A Lamola, Nathaniel E Brese: Electronic device manufacture. Rohm and Haas Electronic Material, S Matthew Cairns, Rohm and Haas Electronic Material, July 27, 2006: US20060167174-A1


Compositions suitable for use as underfill materials in an integrated circuit assembly are provided. Also provided are methods of preparing integrated circuit assemblies containing certain underfill materials as well as electronic devices containing such integrated circuit assemblies.


6
Garo Khanarian
Jeffrey Lawrence Daecher, Steven David Fields, Garo Khanarian, Alan Daniel Stein: Process and apparatus for forming plastic sheet. Rohm and Haas Company, S Matthew Cairns, Darryl P Frickey, John L Lemanowicz, February 6, 2001: US06183829 (40 worldwide citation)


Disclosed is an apparatus for formation of high quality plastic sheet in a continuous fashion. Also disclosed are a variety of optical and electronic display applications for high quality plastic sheet produced in a continuous fashion.


7
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate: Preparation of group IVA and group VIA compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, May 16, 2006: US07045451 (28 worldwide citation)


Methods of preparing Group IVA and Group VIA organometallic compounds, particularly Group IVA organometallic compounds, are provided. Such manufacturing methods employ an amine and/or phosphine catalyst in a transalkylation step and may be performed in a batch, semi-continuous or continuous manner.


8
Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas III, Wang Yueh: Polymer and photoresist compositions. Shipley Company L L C, S Matthew Cairns, June 18, 2002: US06406828 (19 worldwide citation)


Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia


9
Garo Khanarian
Garo Khanarian, Yujian You, Robert H Gore, Angelo A Lamola: Porous optical materials. Shipley Company L L C, S Matthew Cairns, November 22, 2005: US06967222 (17 worldwide citation)


Methods of preparing porous optical materials are provided. These methods allow for the selection of the desired pore size and level of porosity in the porous optical material. Such methods utilize a preformed polymeric porogen.


10
Ed Rutter
Edward W Rutter Jr, Cuong Manh Tran, Edward C Orr: Stripping method. Marlborough, S Matthew Cairns, April 12, 2005: US06878500 (16 worldwide citation)


Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device sub ...



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