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Brian Goodall
Brian Leslie Goodall, Wilhelm Risse, Joice P Mathew: Addition polymers of polycycloolefins containing functional substituents. Thoburn T Dunlap, January 6, 1998: US05705503 (33 worldwide citation)


Addition polymers containing functionally substituted polycyclic repeat units are prepared in the presence of a single or multicomponent catalyst system containing a palladium metal ion source. The catalysts are not poisoned by functional substituents and show good catalytic activity for polymerizin ...


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Brian Goodall
Brian Leslie Goodall, Lester Howard McIntosh III, Dennis Allen Barnes: Homopolymers and copolymers of cationically polymerizable monomers and method of their preparation. The B F Goodrich Company, Nestor W Shust, Thoburn T Dunlap, October 14, 1997: US05677405 (27 worldwide citation)


The invention discloses methods of preparing copolymers from norbornene-type monomers and cationically polymerizable monomers or polymers from catalytically polymerizable monomers by employing Group VIII transition metal ion source in a solvent for said monomers at a temperature in the range from -1 ...


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Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, International Business Machines, Thoburn T Dunlap, Hudak Shunk & Farine Co A, April 20, 2004: US06723486 (23 worldwide citation)


The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


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Brian Goodall
Andrew Bell, Larry F Rhodes, Brian L Goodall, John C Fondran: Mold addition polymerization of norbornene-type monomers using group 10 metal complexes. The B F Goodrich Company, Thoburn T Dunlap, Hudak & Shunk Co LPA, February 26, 2002: US06350832 (16 worldwide citation)


A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-en ...


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Brian Goodall
Brian Leslie Goodall, George Martin Benedikt, Lester Howard McIntosh III, Dennis Allen Barnes, Larry Funderburk Rhodes: Addition polymers derived from norbornene-functional monomers and process therefor. The B F Goodrich Company, Thoburn T Dunlap, April 21, 1998: US05741869 (16 worldwide citation)


Addition polymers derived from norbornene-functional monomers are terminated with an olefinic moiety derived from a chain transfer agent selected from a compound having a terminal olefinic double bond between adjacent carbon atoms, excluding styrenes, vinyl ethers, and conjugated dienes and at least ...


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Brian Goodall
Brian Leslie Goodall, Lester Howard McIntosh III: Method for the preparation of copolymers of ethylene/norbornene-type monomers with cationic palladium catalysts. The B F Goodrich Company, Thoburn T Dunlap, Nestor W Shust, July 24, 2001: US06265506 (7 worldwide citation)


A method of preparing generally amorphous copolymers of ethylene and at least one norbornene (NB)-type comonomer. These polymers may be random or alternating, depending on the choice of catalyst and/or the relative ratio of the monomers used. This method comprises polymerizing said monomers in a dil ...


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Brian Goodall
Larry F Rhodes, Brian L Goodall, Rolf Mülhaupt, Robert A Shick, George M Benedikt, Sai Kumar Jayaraman, Lynn M Soby, Lester H McIntosh III: Blends and alloys of polycyclic polymers. Sumitomo Bakelite, Thoburn T Dunlap, Bernard Berman, Hudak Shunk & Farine Co LPA, November 18, 2003: US06649707 (7 worldwide citation)


Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.


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Brian Goodall
Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow: Polycyclic resist compositions with increased etch resistance. The B F Goodrich Company, International Business Machines Corporation, Thoburn T Dunlap, November 14, 2000: US06147177 (6 worldwide citation)


Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negati ...


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Brian Goodall
Saikumar Jayaraman, Brian L Goodall, Richard Vicari, John Henry Lipian: Processes for making polymers containing pendant cyclic anhydride groups. Sumitomo Bakelite, Thoburn T Dunlap, Hudak Shunk & Farine Co LPA, November 18, 2003: US06649714 (5 worldwide citation)


A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula E



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