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Chang Meng B Hsiung, Bethsabeth Munoz, Ajoy Kumar Roy, Michael Gregory Steinthal, Steven A Sunshine, Michael Allen Vicic, Shou Hua Zhang: Monitoring system for an industrial process using one or more multidimensional variables. Townsend And Townsend And Crew, June 12, 2003: US20030109951-A1 (3 worldwide citation)


A system for monitoring an industrial process and taking action based on the results of process monitoring. Actions taken may include process control, paging, voicemail, and input for e-enterprise systems. The system includes an input module for receiving a plurality of parameters from a process for ...


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Mahyar Zardoshti Kermani: Biosensor apparatus and method with sample type and volume detection. Bozicevic Field & Francis, June 12, 2003: US20030109798-A1 (3 worldwide citation)


A biosensor apparatus and method with sample type and cell volume detection. The apparatus includes a sine wave generator to apply an AC signal to a biosensor cell containing a sample, a current-to-voltage converter, a phase shifter, a square wave generator, a synchronous demodulator, and a low pass ...


13
Charles T Rettner, Bruce D Terris: Patterned media magnetic recording disk drive with timing of write pulses by sensing the patterned media. Ibm Corporation Almaden Research Center, June 12, 2003: US20030107833-A1 (3 worldwide citation)


A magnetic recording disk drive with patterned disk media, wherein discrete magnetic data blocks representative of the individual data bits are isolated from one another, uses the discrete data blocks as the source of the clocking signal to the write head. The carrier for the read/write head include ...


14
Daryl E Anderson, Makarand P Gore, Paul J McClellan: Integrated CD/DVD recording and labeling. Hewlett Packard Company, June 12, 2003: US20030108708-A1 (3 worldwide citation)


An integrated system for individually labeling a recording medium at the time that digital information is recorded thereon, by recording write data with a digital recorder on the read/write surface of the CD/DVD and recording image data by inducing visible color change with a laser in laser sensitiv ...


15
Kanetaka Sekiguchi: Liquid crystal display device. Citizen Watch, Armstrong Westerman & Hattori, June 12, 2003: US20030107692-A1 (2 worldwide citation)


A liquid crystal display device comprising: a first substrate (1) made of a transparent material, provided with signal electrodes and/or display electrodes (9) formed on one face thereof; a second substrate (2) made of a transparent material, provided with opposed electrodes (12) formed thereon; and ...


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Takao Kobayashi, Hisashi Miyazawa: Ink cartridge. Lawrence Rosenthal, Stroock & Stroock & Lavan, June 12, 2003: US20030107629-A1 (2 worldwide citation)


An ink cartridge may have an ink accommodating portion shaped to contain ink, an k supply hole disposed at a bottom of the ink accommodating portion, and a valve unit including a movable valve portion and a fixed valve portion, the movable valve portion being oriented such that a flow of ink is regu ...


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Jeffrey Bode, Craig Fishbeck, Bill Rouse, Ronnie S Royer: Apparatus and methods for utilizing expandable sand screen in wellbores. Weatherford Lamb, William B Patterson, Moser Patterson & Sheridan, June 12, 2003: US20030106697-A1 (2 worldwide citation)


In one aspect of the invention apparatus and methods are provided for completing a wellbore using expandable sand screen. An apparatus including a section of expandable sand screen, and an expanding member is disposed in the wellbore on a tubular run-in string. Thereafter, the expandable sand screen ...


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Takanobu Asano, Katsutoshi Ishii, Hiroyuki Yamamoto, George Hoshi, Kazutoshi Miura: Heat treatment system and method. Smith Gambrell & Russell, June 12, 2003: US20030106495-A1 (2 worldwide citation)


When an oxidation process for semiconductor wafers is carried out by a batch type furnace, the uniformity of the thickness of a film is intended to be improved so as to be capable of carrying out a low temperature process. In a system for feeding a mixed gas of hydrogen gas and water vapor into a re ...


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Haruhiro Harry Goto, William R Harshbarger, Kam S Law: Selectively etching silicon using fluorine without plasma. Applied Materials, Ms 2061, June 12, 2003: US20030109144-A1 (2 worldwide citation)


A process for selectively etching silicon from a workpiece without etching silicon oxide or silicon nitride. The principal etchant gas is molecular fluorine gas (F2) that is not excited to a plasma state.


20
Melissa Claire Caldwell: Hair dressing device method. Workman Nydegger & Seeley, June 12, 2003: US20030106220-A1 (2 worldwide citation)


A hand-held air dressing device (10) has a blade (13) with a sharpened cutting edge. The blade is preferably V or U-shaped and permanently or removably supported by the limbs (12) of a Y-shaped body with an extending hand grip (11). The blade may be made from a single piece or from multiple segments ...



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