1

2
Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, Hudak Shunk & Farine Co, September 14, 2004: US06790579 (46 worldwide citation)


The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


3
Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, International Business Machines, Thoburn T Dunlap, Hudak Shunk & Farine Co A, April 20, 2004: US06723486 (23 worldwide citation)


The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


4
Brian Goodall
Andrew Bell, Larry F Rhodes, Brian L Goodall, John C Fondran: Mold addition polymerization of norbornene-type monomers using group 10 metal complexes. The B F Goodrich Company, Thoburn T Dunlap, Hudak & Shunk Co LPA, February 26, 2002: US06350832 (17 worldwide citation)


A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-en ...


5
Brian Goodall
Edmund Elce, Takashi Hirano, Jeffrey C Krotine Jr, Larry F Rhodes, Brian L Goodall, SaiKumar Jayaraman, W Chris McDougall, Shenliang Sun: Photosensitive compositions based on polycyclic polymers. Sumitomo Bakelite Company, The Webb Law Firm, April 4, 2006: US07022790 (14 worldwide citation)


A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1–R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkary ...


6
Brian Goodall
Larry F Rhodes, Brian L Goodall, Rolf Mülhaupt, Robert A Shick, George M Benedikt, Sai Kumar Jayaraman, Lynn M Soby, Lester H McIntosh III: Blends and alloys of polycyclic polymers. Sumitomo Bakelite, Thoburn T Dunlap, Bernard Berman, Hudak Shunk & Farine Co LPA, November 18, 2003: US06649707 (7 worldwide citation)


Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.


7
Brian Goodall
Larry F Rhodes, Lawrence Seger, Brian L Goodall, Lester H McIntosh III, Robert J Duff: Dissolution rate modifiers for photoresist compositions. Promerus, The Webb Law Firm, September 9, 2008: US07422836 (1 worldwide citation)


Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initia ...


8
Brian Goodall
Andrew Bell, Larry F Rhodes, Brian L Goodall, John C Fondran, Lester H Mclntosh III, Dennis A Barnes: Mold addition polymerization of norbornene-type monomers using group 10 metal complexes. Sumitomo Bakelite, Hudak Shunk & Farine Co A, August 30, 2005: US06936672 (1 worldwide citation)


A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-ene, and 1,4 ...


9
Brian Goodall
Edmund Elce, Takashi Hirano, Jeffrey C Krotine Jr, Larry F Rhodes, Brian L Goodall, SaiKumar Jayaraman, W Chris McDougall, Shenliang Sun: Photosensitive compositions based on polycyclic polymers. Sumitomo Bakelite Company, The Webb Law Firm, February 14, 2012: US08114948


A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1-R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkary ...


10
Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. The BF Goodrich Company, Law Department, September 12, 2002: US20020128408-A1


The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...



Click the thumbnails below to visualize the patent trend.