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Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, Hudak Shunk & Farine Co, September 14, 2004: US06790579 (46 worldwide citation)


The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


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Brian Goodall
Larry Funderburk Rhodes, Andrew Bell, Ramakrishna Ravikiran, John C Fondran, Saikumar Jayaraman, Brian Leslie Goodall, Richard A Mimna, John Henry Lipian: Polymerized cycloolefins using transition metal catalyst and end products thereof. Promerus, Hudak Shunk & Farine Co, June 7, 2005: US06903171 (33 worldwide citation)


Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R′)zM(L′)x(L″)y]b[WCA]d wherein [(R′)zM(L′)x(L″)y] is a cation complex where M represents a Group 10 transition metal; R′ represents an anionic hydrocarby ...


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Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, International Business Machines, Thoburn T Dunlap, Hudak Shunk & Farine Co A, April 20, 2004: US06723486 (23 worldwide citation)


The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


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Brian Goodall
Edmund Elce, Takashi Hirano, Jeffrey C Krotine Jr, Larry F Rhodes, Brian L Goodall, SaiKumar Jayaraman, W Chris McDougall, Shenliang Sun: Photosensitive compositions based on polycyclic polymers. Sumitomo Bakelite Company, The Webb Law Firm, April 4, 2006: US07022790 (14 worldwide citation)


A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1–R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkary ...


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Brian Goodall
Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow: Polycyclic resist compositions with increased etch resistance. The B F Goodrich Company, International Business Machines Corporation, Thoburn T Dunlap, November 14, 2000: US06147177 (6 worldwide citation)


Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negati ...


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Brian Goodall
Saikumar Jayaraman, Brian L Goodall, Richard Vicari, John Henry Lipian: Processes for making polymers containing pendant cyclic anhydride groups. Sumitomo Bakelite, Thoburn T Dunlap, Hudak Shunk & Farine Co LPA, November 18, 2003: US06649714 (5 worldwide citation)


A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula E


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Brian Goodall
Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow: Polycyclic resist compositions with increased etch resistance. The B F Goodrich Company, International Business Machines, Thoburn T Dunlap, Hudak & Shunk Co LPA, September 17, 2002: US06451499 (5 worldwide citation)


Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negati ...


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Brian Goodall
Saikumar Jayaraman, Brian L Goodall, Richard Vicari, John Henry Lipian, Robert David Allen, Juliann Opitz, Thomas I Wallow: Polycyclic polymers containing pendant cyclic anhydride groups. Sumitomo Bakelite, International Business Machines, Thoburn T Dunlap, Hudak Shunk & Farine Co, February 25, 2003: US06525153 (4 worldwide citation)


Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin ...


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Brian Goodall
Larry Funderburk Rhodes, Andrew Bell, Ramakrishna Ravikiran, John C Fondran, Saikumar Jayaraman, Brian Leslie Goodall, Richard A Mimna, John Henry Lipian: Polymerized cycloolefins using transition metal catalyst and end products thereof. Promerus, Bernard Berman, March 22, 2011: US07910674 (1 worldwide citation)


Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R′)zM(L′)x(L″)y]b[WCA]d wherein [(R′)zM(L′)x(L″)y] is a cation complex where M represents a Group 10 transition metal; R′ represents an anionic hydrocarby ...



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