1
Jun Zhao, Talex Sajoto, Leonid Selyutin: Heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, Townsend and Townsend and Crew, January 30, 2001: US06179924 (114 worldwide citation)


The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...


2
Zhao Jun, Sajoto Talex, Selyutin Leonid: Improved heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, March 7, 2001: EP1080485-A1


The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...


3
Zhao Jun, Sajoto Talex, Selyutin Leonid: Improved heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, BERNADICOU Michael A, November 4, 1999: WO/1999/056307


The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...


4
Zhao Jun, Sajoto Talex, Selyutin Leonid: Improved heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, May 25, 2001: KR1020007011915


The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...



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